Methods of forming silicide contact in field-effect transistors

ABSTRACT

A semiconductor structure includes a semiconductor fin extending from a substrate, a source/drain (S/D) feature disposed over the semiconductor fin, a silicide layer disposed over the S/D feature, where the silicide layer extends along a sidewall of the S/D feature, and an etch-stop layer (ESL) disposed along a sidewall of the silicide layer.

CROSS-REFERENCE TO RELATED APPLICATIONS

This is a continuation application of U.S. Application Serial No.17/722,582, filed on Apr. 18, 2022, which is continuation application ofU.S. Application Serial No. 17/102,213, filed on Nov. 23, 2020, which isa divisional application of U.S. Application Serial No. 16/444,735,filed on Jun. 18, 2019, now U.S. Pat. Application No. 10,847,373, whichclaims priority to U.S. Provisional Pat. Application Serial No.62/749,448, filed on Oct. 23, 2018, the entire disclosures of which areincorporated herein by reference.

BACKGROUND

The integrated circuit (IC) industry has experienced exponential growth.Technological advances in IC materials and design have producedgenerations of ICs, where each generation has smaller and more complexcircuits than the previous generation. In the course of IC evolution,functional density (i.e., the number of interconnected devices per chiparea) has generally increased while geometry size (i.e., the smallestcomponent (or line) that can be created using a fabrication process) hasdecreased. This scaling down process generally provides benefits byincreasing production efficiency and lowering associated costs.

Such scaling down has also increased the complexity of processing andmanufacturing ICs and, for these advances to be realized, similardevelopments in IC processing and manufacturing are needed. For example,reducing contact resistance between source/drain features andsource/drain contacts becomes more challenging when device sizescontinue to decrease. Although methods for addressing such challengehave been generally adequate, they have not been entirely satisfactoryin all aspects.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isemphasized that, in accordance with the standard practice in theindustry, various features are not drawn to scale. In fact, thedimensions of the various features may be arbitrarily increased orreduced for clarity of discussion.

FIGS. 1A and 1B illustrate a flowchart of an example method for making asemiconductor device in accordance with some embodiments of the presentdisclosure.

FIG. 2A illustrates a three-dimensional perspective view of an examplesemiconductor device in accordance with some embodiments of the presentdisclosure.

FIG. 2B illustrates a planar top view of an example semiconductor devicein accordance with some embodiments of the present disclosure.

FIGS. 3A, 4A, 5A, 6A, 7A, 8A, 9A, 10A, 11A, 12A, 13A, and 14A illustratecross-sectional views of the semiconductor device of FIGS. 2A and 2Btaken along line AA′ at intermediate stages of an embodiment of themethod of FIGS. 1A and 1B in accordance with some embodiments of thepresent disclosure.

FIGS. 3B, 4B, 5B, 6B, 7B, 8B, 9B, 10B, 11B, 12B, 13B, and 14B illustratecross-sectional views of the semiconductor device of FIGS. 2A and 2Btaken along line BB′ at intermediate stages of an embodiment of themethod of FIGS. 1A and 1B in accordance with some embodiments of thepresent disclosure.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the disclosure.Specific examples of components and arrangements are described below tosimplify the present disclosure. These are, of course, merely examplesand are not intended to be limiting. For example, the formation of afeature on, connected to, and/or coupled to another feature in thepresent disclosure that follows may include embodiments in which thefeatures are formed in direct contact, and may also include embodimentsin which additional features may be formed interposing the features,such that the features may not be in direct contact. In addition,spatially relative terms, for example, “lower,” “upper,” “horizontal,”“vertical,” “above,” “over,” “below,” “beneath,” “up,” “down,” “top,”“bottom,” etc. as well as derivatives thereof (e.g., “horizontally,”“downwardly,” “upwardly,” etc.) are used for ease of the presentdisclosure of one features relationship to another feature. Thespatially relative terms are intended to cover different orientations ofthe device including the features.

Furthermore, when a number or a range of numbers is described with“about,” “approximate,” and the like, the term is intended to encompassnumbers that are within a reasonable range including the numberdescribed, such as within +/- 10% of the number described or othervalues as understood by person skilled in the art. For example, the term“about 5 nm” encompasses the dimension range from 4.5 nm to 5.5 nm.Still further, the present disclosure may repeat reference numeralsand/or letters in the various examples. This repetition is for thepurpose of simplicity and clarity and does not in itself dictate arelationship between the various embodiments and/or configurationsdiscussed. The present disclosure is generally related to semiconductordevices and the fabrication thereof, and more particularly to methods offabricating field-effect transistors (FETs), such as fin-like FETs(FinFETs), gate-all-around FETs (GAA FETs), and/or other FETs.

Embodiments such as those described herein provide methods of formingsilicide contact (hereafter referred to as a silicide layer) over anepitaxial source/drain (S/D) feature in FETs. In particular, the presentdisclosure provides methods of forming a silicide layer that wrapsaround the epitaxial S/D feature to reduce contact resistance betweenthe epitaxial S/D feature and a subsequently formed S/D contactthereover. Generally, a silicide layer is formed over a top surface ofan epitaxial S/D feature after a contact trench (or a contact hole) isformed over the epitaxial S/D feature. As a result, a surface area ofthe silicide layer may be restricted to only a top portion of theepitaxial S/D feature, thereby limiting a contact area between thesilicide layer and the S/D contact. In addition, limitation on thesurface area of the silicide layer may also arise from non-uniform sizesof the epitaxial S/D features. For example, other factors beingconstant, a processing window for forming a silicide layer over a largerepitaxial S/D feature may be more restricted when compared to a silicideformed over a smaller epitaxial S/D feature. Therefore, for at leastthese reasons, improvements in methods of forming silicide layers andcontrolling uniformity of epitaxial S/D features are desired.

FIGS. 1A and 1B illustrates a flow chart of a method 100 for forming asemiconductor device (hereafter referred to as “device”) 200 inaccordance with some embodiments of the present disclosure. The method100 is merely an example and is not intended to limit the presentdisclosure beyond what is explicitly recited in the claims. Additionaloperations can be performed before, during, and after the method 100,and some operations described can be replaced, eliminated, or movedaround for additional embodiments of the method. The method 100 isdescribed below in conjunction with FIG. 3A-14 , which illustratevarious three-dimensional and cross-sectional views of the device 200during intermediate steps of the method 100. In particular, FIG. 2Aillustrates a three-dimensional view of the device 200, FIG. 2Billustrates a planar top view of the device 200, while FIGS. 3A, 4A, 5A,6A, 7A, 8A, 9A, 10A, 11A, 12A, 13A, and 14A illustrate cross-sectionalviews of the device 200 taken along line AA′ as shown in FIG. 2A, andFIGS. FIGS. 3B, 4B, 5B, 6B, 7B, 8B, 9B, 10B, 11B, 12B, 13B, and 14Billustrate cross-sectional views of the device 200 taken along line BB′as shown in FIG. 2A.

The device 200 may be an intermediate device fabricated duringprocessing of an integrated circuit (IC), or a portion thereof, that maycomprise static random-access memory (SRAM) and/or other logic circuits,passive components such as resistors, capacitors, and inductors, andactive components such as p-type FETs (PFETs), n-type FETs (NFETs),fin-like FETs (FinFETs), metal-oxide semiconductor field effecttransistors (MOSFET), complementary metal-oxide semiconductor (CMOS)transistors, bipolar transistors, high voltage transistors, highfrequency transistors, and/or other memory cells The present disclosureis not limited to any particular number of devices or device regions, orto any particular device configurations. For example, though the device200 as illustrated is a three-dimensional FET device (e.g., a FinFET ora GAA FET), the present disclosure may also provide embodiments forfabricating planar FET devices.

Referring to FIGS. 1 and 2A-2B, the method 100 at operation 102 providesthe device 200 that includes one or more semiconductor fins 204protruding from a substrate 202 and separated by isolation structures208 and a dummy gate stack 210 disposed over the substrate 202. Thedevice 200 may include other components, such as gate spacers (notincluded) disposed on sidewalls of the dummy gate stack 210, varioushard mask layers disposed over the dummy gate stack 210 (discussed indetail below), barrier layers, other suitable layers, or combinationsthereof.

The substrate 202 may comprise an elementary (single element)semiconductor, such as silicon, germanium, and/or other suitablematerials; a compound semiconductor, such as silicon carbide, galliumarsenic, gallium phosphide, indium phosphide, indium arsenide, indiumantimonide, and/or other suitable materials; an alloy semiconductor,such as SiGe, GaAsP, AlInAs, AlGaAs, GaInAs, GaInP, GaInAsP, and/orother suitable materials. The substrate 202 may be a single-layermaterial having a uniform composition. Alternatively, the substrate 202may include multiple material layers having similar or differentcompositions suitable for IC device manufacturing. In one example, thesubstrate 202 may be a silicon-on-insulator (SOI) substrate having asilicon layer formed on a silicon oxide layer. In another example, thesubstrate 202 may include a conductive layer, a semiconductor layer, adielectric layer, other layers, or combinations thereof.

In some embodiments where the substrate 202 includes FETs, various dopedregions, such as source/drain regions, are disposed in or on thesubstrate 202. The doped regions may be doped with n-type dopants, suchas phosphorus or arsenic, and/or p-type dopants, such as boron or BF₂,depending on design requirements. The doped regions may be formeddirectly on the substrate 202, in a p-well structure, in an n-wellstructure, in a dual-well structure, or using a raised structure. Dopedregions may be formed by implantation of dopant atoms, in-situ dopedepitaxial growth, and/or other suitable techniques.

Each semiconductor fin 204 may be suitable for providing an n-type FETor a p-type FET. In some embodiments, the semiconductor fins 204 asillustrated herein may be suitable for providing FinFETs of a similartype, i.e., both n-type or both p-type. Alternatively, they may besuitable for providing FinFETs of opposite types, i.e., an n-type and ap-type. This configuration is for illustrative purposes only and is notintended to be limiting. The semiconductor fins 204 may be fabricatedusing suitable processes including photolithography and etch processes.The photolithography process may include forming a photoresist layer(resist) overlying the substrate 202, exposing the resist to a pattern,performing post-exposure bake processes, and developing the resist toform a masking element (not shown) including the resist. The maskingelement is then used for etching recesses into the substrate 202,leaving the semiconductor fins 204 on the substrate 202. The etchingprocess may include dry etching, wet etching, reactive ion etching(RIE), and/or other suitable processes.

Numerous other embodiments of methods for forming the semiconductor fins204 may be suitable. For example, the semiconductor fins 204 may bepatterned using double-patterning or multi-patterning processes.Generally, double-patterning or multi-patterning processes combinephotolithography and self-aligned processes, allowing patterns to becreated that have, for example, pitches smaller than what is otherwiseobtainable using a single, direct photolithography process. For example,in one embodiment, a sacrificial layer is formed over a substrate andpatterned using a photolithography process. Spacers are formed alongsidethe patterned sacrificial layer using a self-aligned process. Thesacrificial layer is then removed, and the remaining spacers, ormandrels, may then be used to pattern the fins.

In the depicted embodiments, referring to FIG. 3A for example, thesemiconductor fin 204 may include alternating layers of semiconductormaterials, e.g., semiconductor material 204A and semiconductor material204B that is different from the semiconductor material 204A. In someexample embodiments, the semiconductor fin 204 may include a total ofthree to ten alternating layers of semiconductor materials; of course,the present disclosure is not limited to such configuration. In thepresent disclosure, the semiconductor material 204A includes Si, whilethe semiconductor material 204B includes SiGe. Either or both of thesemiconductor materials 204A and 204B may be doped with a suitabledopant, such as a p-type dopant or an n-type dopant, for forming desiredFETs. The semiconductor materials 204A and 204B may each be formed by anepitaxial process, such as, for example, a molecular beam epitaxy (MBE)process, a CVD process such as a metal organic CVD (MOCVD) process,and/or other suitable epitaxial growth processes.

In many embodiments, alternating layers of the semiconductor materials204A and 204B are configured to provide multi-gate devices such as GAAFETs, the details of forming which are provided below. Multi-gatedevices have been introduced in an effort to improve gate control byincreasing gate-channel coupling, reduce OFF-state current, and reduceshort-channel effects (SCEs). A multi-gate device such as a GAA FETgenerally includes a gate structure that extends around its horizontalchannel region, providing access to the channel region on all sides. TheGAA FETs are generally compatible with CMOS processes, allowing them tobe aggressively scaled down while maintaining gate control andmitigating SCEs. Of course, the present disclosure is not limited toforming GAA FETs only and may provide other three-dimensional FETs suchas FinFETs. As such, the semiconductor fin 204 may include a singlelayer of semiconductor material or multiple layers of differentsemiconductor materials not configured in an alternating stack, suchthat a uniform fin is provided to form a FinFET.

The isolation structures 208 may include silicon oxide, silicon nitride,silicon oxynitride, fluorine-doped silicate glass (FSG), a low-kdielectric material, and/or other suitable materials. The isolationstructures 208 may include shallow trench isolation (STI) features. Inone embodiment, the isolation structures 208 are formed by etchingtrenches in the substrate 202 during the formation of the semiconductorfins 204. The trenches may then be filled with an isolating materialdescribed above by a deposition process, followed by a chemicalmechanical planarization (CMP) process. Other isolation structure suchas field oxide, local oxidation of silicon (LOCOS), and/or othersuitable structures may also be implemented as the isolation structures208. Alternatively, the isolation structures 208 may include amulti-layer structure, for example, having one or more thermal oxideliner layers. The isolation structures 208 may be deposited by anysuitable method, such as chemical vapor deposition (CVD), flowable CVD(FCVD), spin-on-glass (SOG), other suitable methods, or combinationsthereof. The isolation structures 208 may be formed by depositing adielectric layer as a spacer layer over the semiconductor fins 204 andsubsequently recessing the dielectric layer such that a top surface ofthe isolation structures 208 is below a top surface of the semiconductorfins 204.

In some embodiments, as depicted in FIGS. 3A and 3B, a fin spacer layer214 is formed on the sidewalls of the semiconductor fins 204. The finspacer layer 214 may include any suitable dielectric material, such assilicon nitride, silicon oxide, silicon oxynitride, other suitabledielectric materials, or combinations thereof. In some embodiments, thefin spacer layer 214 includes a dielectric material different from thatof the isolation structures 208 and the dielectric fins 206. The finspacer layer 214 may be first deposited conformally over thesemiconductor fins 204. The dielectric layer for forming the isolationstructures 208 is then deposited over the fin spacer layer 214, therebyfilling in the space in the fin spacer layer 214. Thereafter, thedielectric layer for forming the isolation structures 208 is recessed asdiscussed above to form the semiconductor fins 204 with the fins spacerslayer 214 remaining on the sidewalls of the semiconductor fins 204.

In some embodiments, the device 200 includes dielectric fins 206disposed over the substrate 202. Referring to FIG. 3B, for example, eachdielectric fin 206 may be disposed between the semiconductor fins 204and oriented substantially parallel to the semiconductor fins 204.However, unlike the semiconductor fins 204 configured to provide activedevices, the dielectric fins 206 are inactive and not configured to formFETs. In some embodiments, the dielectric fins 206 are provided toadjust fin-to-fin spacing (i.e., fin pitch) such that the thicknesses ofthe subsequently formed dielectric layers (e.g., dielectric layers 220and 222) may be controlled according to design requirements. Thedielectric fins 206 may be formed by any suitable method. In oneexample, as discussed above, the isolation structures 208 may first bedeposited as a spacer layer over sidewalls of the semiconductor fins204. Before recessing the isolation structures 208 to be lower than thesemiconductor fins 204, a dielectric layer for forming the dielectricfins 206 is deposited over sidewalls of the isolation structures 208.Thereafter, the isolation structures 208 are recessed (e.g., by achemical etching process) such that its top surface is lower than boththe top surface of the semiconductor fins 204 and a top surface of thedielectric layer for forming the dielectric fins 206.

In many embodiments, the dummy gate stack 210 is provided as aplaceholder for subsequently forming a high-k metal gate structure(HKMG; where “high-k” refers to a dielectric constant greater than thatof silicon oxide, which is about 3.9) and may include a dummy gateelectrode 211 and various other material layers. In some embodiments,the dummy gate electrode 211 includes polysilicon. In the depictedembodiments, referring to FIG. 3A, the dummy gate stack may include aninterfacial layer 224 disposed between the semiconductor fins 204 andthe dummy gate electrode 211, a dummy gate dielectric layer (notdepicted), disposed over the interfacial layer 224, a hard mask layer216 disposed over the dummy gate electrode 211, and/or a hard mask layer218 disposed over the hard mask layer 216. As will be discussed indetail below, portions of the dummy gate stack 210 are replaced with theHKMG during a gate replacement process after other components (e.g., theepitaxial S/D features 250) of the device 200 are fabricated. The hardmask layers 216 and 218 may each include any suitable dielectricmaterial, such as a semiconductor oxide and/or a semiconductor nitride.In one example, the hard mask layer 216 includes silicon carbonitride,and the hard mask layer 218 includes silicon oxide. The interfaciallayer 224 may include any suitable material, such as silicon oxide.Various material layers of the dummy gate stack 210 may be formed by anysuitable process, such as CVD, PVD, ALD, chemical oxidation, othersuitable processes, or combinations thereof.

Now referring to FIGS. 1A, 3A, and 3B, the method 100 at operation 104forms a dielectric layer 220 over the device 200. In many embodiments,the dielectric layer 220 is formed conformally over the device 200,including the semiconductor fins 204, the dielectric fins 206, and thedummy gate stacks 210. The dielectric layer 220 may include any suitabledielectric material, such as a nitrogen-containing dielectric material,and may be formed by any suitable method, such as ALD, CVD, PVD, othersuitable methods, or combinations thereof. In the depicted embodiment,the dielectric layer 220 is formed by a thermal ALD process. In someexamples, the dielectric layer 220 may include silicon nitride, siliconcarbonitride, silicon oxycarbonitride, other suitable dielectricmaterials, or combinations thereof. In the depicted embodiment, thedielectric layer 220 includes two portions: portion 220A that isdeposited on sidewalls of the semiconductor fins 204 and portion 220Bthat is deposited on sidewalls of the dielectric fins 206. Infurtherance to the embodiment, the portions 220A and 220B are separatedby a subsequently formed dielectric layer 222 (discussed below).

Still referring to FIGS. 1A, 3A, and 3B, the method 100 at operation 106forms a dielectric layer 222 over the dielectric layer 220. Similar tothe dielectric layer 220, the dielectric layer 222 is formed conformallyover the dummy gate stacks 210. Notably, because the presence of thedielectric fins 206 reduces the fin-to-fin spacing as depicted in FIG.3B, the dielectric layer 222 may fill any gap formed over the dielectriclayer 220. The dielectric layer 222 may include any suitable dielectricmaterial, such as an oxygen-containing dielectric material or a high-kdielectric material, and may be formed by any suitable method, such asALD, CVD, PVD, other suitable methods, or combinations thereof. In thedepicted embodiment, the dielectric layer 220 is formed by a thermal ALDprocess. In some examples, the dielectric layer 222 may include siliconoxide, silicon oxycarbide, a high-k dielectric material (e.g., hafniumoxide, zirconium oxide, lanthanum oxide, yttrium oxide, etc.), othersuitable dielectric materials, or combinations thereof. Notably, thoughnot limited to any specific values, thicknesses of the dielectric layers220 and 222 may be determined by the fin-to-fin spacing between thesemiconductor fins 204 and the dielectric fins 206. For example, each ofthe dielectric layers 220 and 222 may formed to a thickness of less thanabout 10 nm. Furthermore, in the present disclosure, the dielectriclayers 220 and 222 include different compositions, such that an etchingselectivity exists between the two material layers when both aresubjected to a common etchant.

Now referring to FIGS. 1A, 4A, and 4B, the method 100 at operation 108removes a portion of the semiconductor fins 204 to form a recess 230. Inmany embodiments, the method 100 forms the recess 230 by a suitableetching process, such as a dry etching process, a wet etching process,or an RIE process. In some embodiments, the method 100 selectivelyremoves the semiconductor fins 204 without etching or substantiallyetching portions of the dielectric layers 220 and 222 formed onsidewalls of the semiconductor fins 204 and the dielectric fins 206. Asdepicted herein, portions of the dielectric layers 220 and 222 as wellas the hard mask layer 218 formed over the dummy gate electrode and thedielectric fins 206 may be removed at operation 108 to form the recess230. The etching process at operation 108 may implement a dry etchingprocess using an etchant including a bromine-containing gas (e.g., HBrand/or CHBr₃), a fluorine-containing gas (e.g., CF₄, SF₆, CH₂F₂, CHF₃,and/or C₂F₆), other suitable gases, or combinations thereof. The extentof which the semiconductor fins 204 is removed may be controlled byadjusting the duration of the etching process. In some embodiments, theetching process at operation 108 also removes portions of the dielectriclayer 222 formed over a top surface of the dielectric layer 220.

Referring to FIGS. 1A, 5A, and 5B, the method 100 at operation 110removes the portions 220A of the dielectric layer 220, thereby laterallyenlarging the recess 230. In many embodiments, the portions 220A areremoved by a suitable etching process, such as an isotropic wet etchingprocess. In some examples, the etching process may be implemented usinga mixture of hydrofluoric acid (HF) and ammonia (NH₃) as etchant.Notably, the etching process at operation 110 selectively removes theportions 220A without removing or substantially removing the dielectriclayer 222 and the dielectric fins 206. As such, an etching selectivitybetween the dielectric layer 220 and the dielectric layer 222 and/or thedielectric fins 206 may be at least 4 with respect to the etchant usedduring the etching process at operation 110. Due to the small opening ofthe recess 230, excess etchant may inadvertently remove a small amountof the portions 220B (e.g., a loss of about 7 nm to about 10 nm ofheight). However, such loss is minute and does not substantially affectthe subsequent fabrication steps.

In some embodiments, operations 108 and 110 may be combined such thatportions of the semiconductor fins 204 and the portion 220A of thedielectric layer 220 are removed in a single fabrication step. Toaccomplish this, the etching process for removing portions of thesemiconductor fins 204 and the portion 220A may be fine-tuned such thatthe etching selectivity between the semiconductor fins 204 and thedielectric layer 222 and between the dielectric layer 220 and thedielectric layer 222 is large, but the etching selectivity between thesemiconductor fins 204 and the dielectric layer 220 is minimal orinsignificant. In some examples, the etching process may be a dryetching process for which the etching selectivity between thesemiconductor fins 204 and the dielectric layer 222 (and between thedielectric layer 220 and the dielectric layer 222) may be at least 4.The dry etching process may be implemented using a bromine-containingetchant (e.g., HBr and/or CHBr₃), a fluorine-containing etchant (e.g.,CF₄, SF₆, CH₂F₂, CHF₃, and/or C₂F₆), other suitable gases, orcombinations thereof. Additionally, to achieve such etching selectivity,the dielectric layer 220 (including the portions 220A and 220B) mayinclude a metal oxide material, such as aluminum oxide, hafnium oxide,zirconium oxide, other metal oxide materials, or combinations thereof.

In the depicted embodiment, referring back to FIG. 4B, due to theselective etching process at operation 108, a width w of the recess 230is defined by a width of the semiconductor fin 204. When the portions220A are subsequently removed during operation 110, referring to FIG.5B, the width w increases to w₁, which accounts for both the width ofthe semiconductor fin 204 as well as the thickness of the dielectriclayer 220 (i.e., the portions 220A). Therefore, the width w₁ may betuned by adjusting the thickness of the dielectric layer 220 during thedeposition process at operation 104 as discussed above. In someexamples, the thickness of the dielectric layer 220 may be adjusted byadjusting the duration of the deposition process. In some examples, thewidth w₁ may range from about 20 nm to about 30 nm. Notably, becauseboth the formation and the removal of the semiconductor fins 204 and theportions 220A are controlled as discussed above (e.g., conformaldeposition and selective etching), the width w₁ is well-defined withlittle variation. Advantageously, because each recess 230 provides thespace for subsequent epitaxial growth of a source/drain (S/D) feature, awell-defined width w₁ serves to keep uniform the size of the epitaxialS/D feature, thereby improving the resulting device performance.

Referring to back to FIG. 1A, for embodiments in which the semiconductorfins 204 includes two distinct semiconductor materials 204A and 204B,the method 100 proceeds to operations 112, 114, and 116 to form portionsof a multi-gate device (e.g., a GAA FET). It is understood thatoperations 112, 114, and 116 discussed herein are mere examples, suchthat if other types of devices (e.g., FinFETs) are desired, the method100 may directly proceed to operation 118 as illustrated in FIG. 1B.

Referring to FIGS. 6A-6B, the method 100 at operation 112 selectivelyremoves portions of the semiconductor material 204B by a suitableetching process to form gaps between layers of the semiconductormaterial 204A, such that portions of the semiconductor material 204Asuspend in space. As discussed above, the semiconductor material 204Aincludes Si and the semiconductor material 204B includes SiGe.Accordingly, the etching process at operation 112 selectively removespotions of SiGe without removing or substantially remove Si. In someembodiments, the etching process is an isotropic etching process (e.g.,a dry etching process or a wet etching process), and the extent of whichthe semiconductor material 204B is removed is controlled by duration ofthe etching process. In an example embodiment, the method 100selectively removes portions of the semiconductor material 204B by a wetetching process that utilizes HF and/or NH₄OH as an etchant, whichinitially oxidizes portions of the semiconductor material 204B to formSiGeOx and subsequently removes the SiGeOx.

Now referring to FIGS. 1A, 7A, and 7B, the method 100 at operation 114deposits a spacer layer 240 over the device 200. In many embodiments,the spacer layer 240 is formed conformally over the device 200 such thatit is formed on sidewalls of the dummy gate stacks 210 and the remainingportions of the semiconductor fins 204 (i.e., including thesemiconductor materials 204A and 204B). In the depicted embodiments, thespacer layer 240 is formed on the dielectric layer 222 and on topsurfaces of the portion 220B and the dielectric fins 206. Referring toFIG. 7A, the spacer layer 240 may fill up the space between layers ofthe semiconductor material 204A. In some embodiments, the spacer layer240 is deposited by any suitable method, such as ALD, to any suitablethickness. In some examples, the spacer layer 240 may include anysuitable dielectric material, such as silicon nitride, silicon oxide,silicon carboxynitride, silicon oxycarbide, other suitable dielectricmaterials, or combinations thereof.

Thereafter, referring to FIGS. 1A, 8A, and 8B, the method 100 atoperation 116 removes portions of the spacer layer 240 in an etchingprocess such that only portions of the spacer layer 240 remain onsidewalls of the semiconductor material 204B. The remaining portions ofthe spacer layer 240 form spacers on exposed sidewalls of thesemiconductor material 204B and are configured to facilitate subsequentfabrication steps for forming multi-gate devices. In some examples, theremaining portions of the spacer layer 240 are configured to reduceparasitic capacitance of the resulting multi-gate devices. In someembodiments, the etching process at operation 116 is an isotropicetching process, and the extent of which the spacer layer 240 is removedis controlled by duration of the etching process. In some examples, athickness of the spacer layer 240 removed by the etching process atoperation 116 may be about 3 nm to about 7 nm. Of course, the presentdisclosure is not limited to this range of dimensions.

Referring to FIGS. 1B, 9A, and 9B, the method 100 proceeds to operation118 to form an epitaxial S/D feature 250 in the recess 230. Referring toFIG. 9A, the epitaxial S/D feature 250 may include multiple epitaxialsemiconductor layers, e.g., a layer 252 and a layer 254. In someembodiments, the layers 252 and 254 differ in amount of dopant includedtherein. In some examples, the amount of dopant included in the layer252 is less than that included in the layer 254; of course, the presentdisclosure is not limited to this configuration. Referring to FIG. 9B,the epitaxial S/D feature 250 (only the layer 254 is depicted in thisview) is formed in the recess 230 and along sidewalls of the dielectriclayer 222. In other words, the growth of the epitaxial S/D feature 250is laterally confined by the width w₁ of the recess 230. As discussedabove, because the recess 230 has a well-defined width w₁ formed as aresult of controlled deposition and selective etching of thesemiconductor fins 204 and the portions 220A of the dielectric layer220, the size of the epitaxial S/D feature 250 may also be wellcontrolled to substantially uniform sizes (i.e., having the width w₁with little variations. In many embodiments, the width w₁ of eachepitaxial S/D feature 250 is defined by a width of each semiconductorfin 204 and a thickness of the dielectric layer 220 (see FIGS. 4B and5B). In the depicted embodiment, a bottom portion of each epitaxial S/Dfeature 250 and the dielectric layer 220 is separated by an air gap 288;however, the present disclosure is not limited to such configuration.

The epitaxial S/D feature 250 (i.e., the layers 252 and 254 includedtherein) may be formed by any suitable method, such as MBE, MOCVD, othersuitable epitaxial growth processes, or combinations thereof. Theepitaxial S/D feature 250 may be suitable for a p-type FinFET device(e.g., a p-type epitaxial material) or alternatively, an n-type FinFETdevice (e.g., an n-type epitaxial material). The p-type epitaxialmaterial may include one or more epitaxial layers of silicon germanium(epi SiGe), where the silicon germanium is doped with a p-type dopantsuch as boron, germanium, indium, and/or other p-type dopants. Then-type epitaxial material may include one or more epitaxial layers ofsilicon (epi Si) or silicon carbon (epi SiC), where the silicon orsilicon carbon is doped with an n-type dopant such as arsenic,phosphorus, and/or other n-type dopant.

Referring to FIGS. 1B, 10A, and 10B, the method 100 at operation 120selective removes the dielectric layer 222 by any suitable etchingprocess to form a recess 260 adjacent to the epitaxial S/D feature 250(e.g., the layer 254). In many embodiments, the etching process removesthe dielectric layer 222 disposed between the epitaxial S/D features 250and the portions 220B of the dielectric layer 220. The etching processmay implement any suitable etchant configured to remove the dielectriclayer 222 without removing or substantially removing the epitaxial S/Dfeatures 250 and the dielectric layer 220. In some examples, the etchingprocess may be an isotropic etching process (e.g., an isotropic dryetching or an isotropic wet etching process) that implements an etchantthat includes hydrofluoric acid (HF), ammonia (NH₃), nitrogentrifluoride (NF₃), other suitable etchants, or combinations thereof.Similar to the formation of the recess 230, the recess 260 is configuredto have well-defined width w′ determined by the thickness of thedielectric layer 222. Accordingly, when selectively removed at operation120, the width w′ of the recess 260 may thus be uniform or substantiallyuniform. In some examples, the width w′ ranges from about 5 nm to about15 nm. In many embodiments, as discussed below, the recess 260 isconfigured to accommodate the formation of a silicide layer that wrapsthe epitaxial S/D feature 250.

Referring to FIGS. 1B, 11A, and 11B, the method 100 may proceed to anoperation 122 during which the remaining portions (i.e., the portions220B) of the dielectric layer 220 are selectively removed by a suitableetching process, thereby enlarging the recess 260 to a width w₁’.Operation 122 may be implemented by an isotropic dry or wet etchingprocess using a combination of HF, NH₃, and/or NF₃ as an etchant. Insome embodiments, the etching recipe for removing the remaining portionsof the dielectric layer 220 is similar to that for removing thedielectric layer 222; however, the etching selectivity would befine-tuned such that the etching process at operation 122 selectivelyremoves the dielectric layer 220 without etching or substantiallyetching the dielectric fins 206 or the epitaxial S/D feature 250. Insome embodiments, enlarging the recess 260 may be implemented ininstances where an air gap disposed between the epitaxial S/D feature250 and the dielectric fin 206 is desired to, for example, reduce theparasitic capacitance of the device 200. Alternatively or additionally,it may be desirable to enlarge the recess 260 to accommodate depositionof a silicide layer (e.g., the silicide layer 270 discussed below) fordevice performance and/or deposition capability consideration. In someembodiments, the operation 122 may be omitted from the method 100, i.e.,the method 100 may proceed from operation 120 to operation 124 directly.

Referring to FIGS. 1B, 12A, and 12B, the method 100 at operation 124forms a silicide layer 270 over the epitaxial S/D feature 250 in therecess 260, such that the silicide layer 270 wraps around the epitaxialS/D feature 250 (e.g., the layer 254 as depicted in FIG. 12B). In manyembodiments, the silicide layer 270 includes nickel silicide, cobaltsilicide, tungsten silicide, tantalum silicide, titanium silicide,platinum silicide, erbium silicide, palladium silicide, other suitablesilicide, or combinations thereof. The silicide layer 270 may be formedby any suitable method. In one example, a metal layer (e.g., nickel) maybe deposited over the device 200 by a deposition process such as CVD,ALD, PVD, other suitable processes, or combinations thereof. Then, thedevice 200 is annealed to allow the metal layer and the semiconductormaterials of the epitaxial S/D feature 250 to react and form thesilicide layer 270. Thereafter, the un-reacted metal layer is removed,leaving the silicide layer 270 over the epitaxial S/D feature 250. Inanother example, a metal layer may be selectively deposited over thesemiconductor materials of the epitaxial S/D feature 250 by a suitabledeposition method provided herein. Thereafter, the device 200 isannealed to form the silicide layer 270 over the epitaxial S/D feature250 in the recess 260. In some embodiments, depending upon the specificvalue of the width w₁’ of the recess 260, the silicide layer 270partially or completely fills the recess 260 at operation 124. In someexamples, the silicide layer 270 may be formed to a thickness of about 5nm to about 10 nm, which may range from about 30% to about 100% of thewidth w₁’ of the recess 260. As such, depending upon the thickness ofthe silicide layer 270, an air gap 294 may remain between the portions220B and the silicide layer 270 after forming the silicide layer 270 atoperation 124.

Notably, because operation 124 is implemented after recessing thedielectric layer 222 and before forming an S/D contact, the recess 260provides space for the silicide layer 270 to be formed on exposedsurfaces of the epitaxial S/D feature 250, such that the silicide layer270 wraps around the epitaxial S/D feature 250. Advantageously,embodiments provided herein increase the contact area between thesilicide layer 270 and the epitaxial S/D feature 250, thereby reducingthe contact resistance between the epitaxial S/D features 250 and theS/D contact formed hereafter.

Referring to FIGS. 1B, 13A, and 13B, the method 100 at operation 126replaces the dummy gate stack 210 with a metal gate structure 280 in agate replacement process. In the present embodiments, the metal gatestructure 280 is a high-k metal gate structure (HKMG), where “high-k”indicates that the metal gate structure 280 includes a gate dielectriclayer having a dielectric constant greater than that of silicon oxide(about 3.9). The gate replacement process at operation 126 may beimplemented in a series of fabrication steps as discussed in detailbelow.

In some embodiments, the method 100 first deposits a contact etch-stoplayer (CESL) 282 over the device 200. The CESL 282 may include siliconnitride, silicon oxynitride, silicon nitride with oxygen or carbonelements, other suitable materials, or combinations thereof, and may beformed by CVD, PVD, ALD, other suitable methods, or combinationsthereof. The method 100 then deposits an interlayer dielectric (ILD)layer 284 over the CESL 282. The ILD layer 284 includes a dielectricmaterial, such as tetraethylorthosilicate (TEOS), un-doped silicateglass, or doped silicon oxide such as borophosphosilicate glass (BPSG),fluorine-doped silicate glass (FSG), phosphosilicate glass (PSG), borondoped silicon glass (BSG), other suitable dielectric materials, orcombinations thereof. The ILD layer 284 may include a multi-layerstructure having multiple dielectric materials and may be formed by adeposition process such as, for example, CVD, flowable CVD (FCVD),spin-on-glass (SOG), other suitable methods, or combinations thereof. Insome embodiments, forming the ILD layer 284 further includes performinga CMP process to planarize a top surface of the device 200, such that atop surface of the dummy gate stack 210 is exposed.

For embodiments in which a multi-gate device (e.g., a GAA FET) isdesired, referring to FIG. 13A for example, before forming the CESL 282and/or the ILD layer 284, the semiconductor layers 204B (including SiGe)are selectively removed from the semiconductor fins 204 in an etchingprocess, such that voids or gaps (not depicted) are formed betweenstacks of the semiconductor layers 204A (including Si). In someembodiments, the etching process may be a dry etching process or a wetetching process. In an example embodiment, the method 100 selectivelyremoves portions of the semiconductor material 204B by a wet etchingprocess that utilizes HF and/or NH₄OH as an etchant.

Thereafter, the method 100 at operation 126 removes the dummy gate stack210 by any suitable method to form a gate trench (not depicted) over thesemiconductor fins 204. Forming the gate trench may include one or moreetching processes that are selective to the materials included in thedummy gate stack 210 (e.g., the polysilicon included in the dummy gateelectrode 211). The etching processes may include dry etching, wetetching, RIE, or other suitable etching methods, or combinationsthereof.

Then, the method 100 proceeds to forming the metal gate structure 280 inthe gate trench. For embodiments in which the semiconductor fin 204includes alternating stacks of the semiconductor materials 204A and204B, various material layers of the metal gate structure 280 are alsodeposited in the gaps formed between the layers of the semiconductormaterial 204A after the semiconductor material 204B is removed from thedevice 200. Though not depicted, the metal gate structure 280 mayinclude multiple material layers, such as a high-k gate dielectric layerformed over the interfacial layer 224, a work function metal layerformed over the high-k gate dielectric layer, a bulk conductive layerformed over the work function metal layer, other suitable layers, orcombinations thereof. The metal gate structure 280 may include othermaterial layers, such as a barrier layer, a glue layer, a hard masklayer, and/or a capping layer. The high-k dielectric layer may includeone or more high-k dielectric materials (or one or more layers of high-kdielectric materials), such as hafnium silicon oxide (HfSiO), hafniumoxide (HfO₂), alumina (Al₂O₃), zirconium oxide (ZrO₂), lanthanum oxide(La₂O₃), titanium oxide (TiO₂), yttrium oxide (Y₂O₃), strontium titanate(SrTiO₃), or a combination thereof. The work function metal layer mayinclude any suitable material, such as titanium nitride (TiN), tantalumnitride (TaN), ruthenium (Ru), molybdenum (Mo), tungsten (W), platinum(Pt), titanium (Ti), aluminum (Al), tantalum carbide (TaC), tantalumcarbide nitride (TaCN), tantalum silicon nitride (TaSiN), titaniumsilicon nitride (TiSiN), other suitable materials, or combinationsthereof. In some embodiments, the work function metal layer includesmultiple material layers of the same or different types (i.e., bothn-type work function metal or both p-type work function metal) in orderto achieve a desired threshold voltage. The bulk conductive layer mayinclude aluminum (Al), copper (Cu), tungsten (W), cobalt (Co), ruthenium(Ru), other suitable conductive materials, or combinations thereof. Thevarious layers of the metal gate structure 280 may be formed by anysuitable method, such as CVD, ALD, PVD, plating, chemical oxidation,thermal oxidation, other suitable methods, or combinations thereof.Thereafter, the method 100 may perform one or more polishing process(e.g., CMP) to remove any excess conductive materials and planarize thetop surface of the device 200.

Referring to FIGS. 14A and 14B, illustrated are views of an exampleembodiment of the device 200 after the implementation of operations 122and 126, i.e., after the remaining portions (i.e., the portions 220B) ofthe dielectric layer 220 are selectively removed. The example embodimentshown in FIGS. 14A and 14B is similar to that illustrated in FIGS. 13Aand 13B, respectively, with the exception that the CESL 282 is disposedon sidewalls of the metal gate structure 280 as shown in FIG. 14A andbetween sidewalls of the semiconductor fins 204 and the dielectric fins206 as shown in FIG. 14B.

Referring to FIG. 1B, the method 100 at operation 128 may performadditional processing steps. For example, additional verticalinterconnect features such as an S/D contact 290 as depicted in FIGS.13B and 14B and/or vias, and/or horizontal interconnect features such aslines, and multilayer interconnect features such as metal layers andinterlayer dielectrics can be formed over the device 200. The variousinterconnect features may implement various conductive materialsincluding copper (Cu), tungsten (W), cobalt (Co), aluminum (Al),titanium (Ti), tantalum (Ta), platinum (Pt), molybdenum (Mo), silver(Ag), gold (Au), manganese (Mn), zirconium (Zr), ruthenium (Ru), theirrespective alloys, metal silicides, other suitable materials, orcombinations thereof. The metal silicides may include nickel silicide,cobalt silicide, tungsten silicide, tantalum silicide, titaniumsilicide, platinum silicide, erbium silicide, palladium silicide, othersuitable metal silicides, or combinations thereof.

Although not intended to be limiting, one or more embodiments of thepresent disclosure provide many benefits to a semiconductor device andthe formation thereof. The present disclosure provides methods offorming a silicide layer over an epitaxial S/D feature. Embodiments ofthe present disclosure includes forming a silicide layer that wrapsaround the epitaxial S/D feature. In many embodiments, sequentialremoval (e.g., selective etching) of multiple fin sidewall spacers isconfigured to define spaces in which the epitaxial S/D feature and thesilicide layer are formed before forming contact trenches (or contactholes). Accordingly, adequate processing window for forming uniformlysized epitaxial S/D features and wrap-around silicide layer are providedfor purposes of reducing contact resistance between the epitaxial S/Dfeatures and the S/D contacts.

In one aspect, the present disclosure provides a semiconductor structurethat includes a semiconductor fin extending from a substrate, asource/drain (S/D) feature disposed over the semiconductor fin, asilicide layer disposed over the S/D feature, where the silicide layerextends along a sidewall of the S/D feature, and an etch-stop layer(ESL) disposed along a sidewall of the silicide layer.

In another aspect, the present disclosure provides a semiconductorstructure that includes a semiconductor fin extending from a substrate,an S/D feature disposed over the semiconductor fin, a silicide layerwrapping around the S/D feature, an ESL disposed along and in directcontact with sidewalls of the silicide layer, and an air gap exposing abottom portion of the S/D feature.

In yet another aspect, the present disclosure provides a semiconductorstructure that includes a semiconductor fin extending from a substrate,an S/D feature disposed over the semiconductor fin, a silicide layerdisposed along and directly contacting the S/D feature, an ESL extendingalong sidewalls of the silicide layer, and an air gap disposed below abottom portion of the S/D feature.

The foregoing has outlined features of several embodiments so that thoseskilled in the art may better understand the detailed description thatfollows. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A method, comprising: providing a workpiececomprising a gate structure over a semiconductor fin that protrudes froma substrate; forming a dielectric structure extending along sidewalls ofthe gate structure and the semiconductor fin; etching back thesemiconductor fin to form a first recess; removing a first portion ofthe dielectric structure to laterally enlarge the first recess; forminga source/drain (S/D) feature in the enlarged first recess; after theforming of the S/D feature, removing a second portion of the dielectricstructure to form a second recess; forming a silicide layer in thesecond recess and on the S/D feature; and after the forming of thesilicide layer, forming an etch stop layer on the silicide layer and adielectric layer on the etch stop layer.
 2. The method of claim 1,wherein the forming of the dielectric structure comprises: conformallydepositing a first dielectric material layer over the workpiece; anddepositing a second dielectric material layer over the workpiece to fillspaces between portions of the first dielectric material layer, acomposition of the first dielectric material layer is different than acomposition of the second dielectric material layer.
 3. The method ofclaim 2, wherein the first dielectric material layer comprises a portionextending along a sidewall surface of the semiconductor fin, wherein theremoving of the first portion of the dielectric structure comprisesperforming an etching process to remove the portion of the firstdielectric material layer.
 4. The method of claim 3, wherein the etchingprocess implements an etchant including hydrofluoric acid, ammonia, or acombination thereof.
 5. The method of claim 2, wherein the removing ofthe second portion of the dielectric structure comprises performing anetching process to selectively remove the second dielectric materiallayer.
 6. The method of claim 1, further comprising: after the formingof the etch stop layer and the dielectric layer, replacing the gatestructure with a gate stack including a high-K dielectric layer.
 7. Themethod of claim 1, further comprising: after the forming of the etchstop layer and the dielectric layer, forming a source/drain contactextending through the etch stop layer and the dielectric layer todirectly contact the silicide layer.
 8. A method, comprising: receivinga workpiece comprising a dummy gate structure engaging a semiconductorfin protruding from a substrate, the dummy gate structure extendinglengthwise along a first direction; recessing the semiconductor fin toform a source/drain recess; enlarging the source/drain recess along thefirst direction; forming a source/drain feature in the enlargedsource/drain recess; forming a silicide layer extending along a sidewallsurface and a top surface of the source/drain feature; after the formingof the silicide layer, replacing the dummy gate structure with a metalgate stack.
 9. The method of claim 8, wherein the semiconductor fincomprises a vertical stack of alternating channel layers and sacrificiallayers.
 10. The method of claim 9, further comprising: after theenlarging of the source/drain recess along the first direction,selectively recessing the sacrificial layers along a second direction toform inner spacer recesses, the second direction is substantiallyperpendicular to the first direction; and forming inner spacer featuresin the inner spacer recesses.
 11. The method of claim 10, wherein thereplacing of the dummy gate structure with the metal gate stackcomprises: after the forming of the silicide layer, depositing a contactetch-stop layer (CESL) over the silicide layer; forming an interlayerdielectric (ILD) layer over the CESL; removing the dummy gate structureto from a gate trench; removing the sacrificial layers to from openings;and forming the metal gate stack in the gate trench and the openings towrap around each of the channel layers.
 12. The method of claim 8,wherein the workpiece further comprises a dielectric fin disposedadjacent to the semiconductor fin along the first direction, and themethod further comprises: before the recessing of the semiconductor finto form the source/drain recess, forming a first dielectric layer overthe workpiece, the first dielectric layer comprises a first portionextending along a sidewall surface of the semiconductor fin and a secondportion extending along a sidewall surface of the dielectric fin; andforming a second dielectric layer between the first and second portionsof the first dielectric layer.
 13. The method of claim 12, wherein theenlarging of the source/drain recess along the first direction comprisesremoving the first portion of the first dielectric layer.
 14. The methodof claim 12, further comprising: before the forming of the silicidelayer, selectively removing the second dielectric layer.
 15. The methodof claim 14, further comprising: after the selectively removing of thesecond dielectric layer, selectively removing the second portion of thefirst dielectric layer.
 16. A method, comprising: forming asemiconductor fin protruding from a substrate; forming a source/drainfeature in and over a source/drain region of the semiconductor fin;forming a silicide layer extending along a sidewall surface and a topsurface of the source/drain feature; conformally forming a contact etchstop layer, the contact etch stop layer comprises a first portionextending along a sidewall surface of the silicide layer and a secondportion on a top surface of the source/drain feature; and forming asource/drain contact extending through the second portion of the contactetch stop layer to directly contact the silicide layer.
 17. The methodof claim 16, further comprising: forming a dielectric fin adjacent tothe semiconductor fin; comfortably depositing a first dielectric layerover the dielectric fin and the semiconductor fin; and forming a seconddielectric layer over the first dielectric layer, wherein the firstportion of the contact etch stop layer is disposed between the silicidelayer and the dielectric fin.
 18. The method of claim 17, wherein acomposition of the first dielectric layer is different from acomposition of the second dielectric layer.
 19. The method of claim 17,wherein the forming of the source/drain feature comprises: removing thesource/drain region of the semiconductor fin and a portion of the firstdielectric layer that extends along the semiconductor fin to form asource/drain recess; and performing an epitaxial growth process to formthe source/drain feature in the source/drain recess.
 20. The method ofclaim 17, further comprising: before the forming of the silicide layer,selectively removing the second dielectric layer.